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Laser Etching System for ITO Film

Model: TH-ITOF0405


Introduction
1. The laser etching system for ITO film is a sophisticated machine which can etch ITO film coated on glass and PET substrates.
2. It can etch patterns in large areas on ITO film, polycrystalline film and other oxide films. It can etch various sizes with high speed, high precision, and high yield.
3. Laser dry etching takes only 1 step while the wet etching takes 5 steps. So the machine saves labor and production cost.
4. The laser etching system for ITO film adopts CCD auto location, which is easy for operation.
5. It is driven by linear motor and high speed galvo scanning, thus ensuring high-speed processing with large working area.
6. It is widely favored in market due to its high stability and low cost.

Laser Etching System for ITO Film
Technical Data
Specification/ModelTH-ITOF0405
Processing Area400x500mm
Min. Line Width≤40um
Min. Line Distance≥30um
Precision±20um
Wavelength1064nm
Etching Speed≤7000mm/s

Sample




ITO Etching 1 ITO Etching 2

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